Blogs and Articles

wet wafer cleaning

The Art and Science of Wet Wafer-Cleaning Technology

July 24, 2026 ~ While it might not receive as much attention as extreme ultraviolet (EUV) lithography, wet wafer cleaning and surface preparation remains one of the most critical processes in semiconductor manufacturing. Device reliability, yield and long-term performance are all directly linked to wafer cleanliness as devices pass through hundreds of process steps including deposition, implantation, polishing, etching, patterning, and interconnect process steps.  Even a single particle or trace […] Read More

panel-level packaging

AI Spurring Growth of Panel-Level Packaging

July 22, 2026 ~ It’s not news that artificial intelligence (AI) is driving larger and larger chip packages. Nvidia’s Blackwell architecture helped define the rapid move toward multi-reticle packages for generative AI chips; its Blackwell B200 superchip is essentially a massive dual-die processor (2 x 800mm2 for total area of ~1600mm2), built to the reticle limit of 208 billion transistors.1  A round 300mm wafer can fit about 64 800mm2 chips, but since the chip is square and the wafer is round, a significant […] Read More

Ultra Pmax PECVD tool

PECVD: Solving TSV Gap Challenges for Advanced Packaging

June 23, 2026 ~ Welcome to Part 3 of our blog series on optimizing through-silicon vias (TSVs), vertical interconnect structures vital to heterogeneous integration of multiple components for 2.5D/3D packaging techniques. Part 1 introduced the TSV formation process and post-via cleaning, and Part 2 delved into the role electroplating plays in TSV creation. In this installment, we look at […] Read More

Two semiconductor wafers

SPM Wafer Cleaning for Advanced Semiconductor Manufacturing

June 11, 2026 ~ Wafer cleaning is one of the most critical steps in the semiconductor process flow, especially as dimensions continue to shrink to below the 1-nanometer (nm) node. Photoresist residue and particulates can reduce yields in large-die AI chips, impacting the performance of the final product or causing the chips to be scrapped.   The sulfuric acid hydrogen peroxide step, or sulfuric peroxide mixture (SPM), is essential for removing organic contaminants from post-etch substrates and ion-implanted films, as well as for platinum silicide residue removal. SPM processes traditionally have been performed in tanks […] Read More

The image depicts a solar system–themed layout with planets labeled as different series of ACM core processing tools. A spacecraft labeled “ACM” travels through the system. Planets include Mercury, Venus, Earth, Mars, Jupiter, Saturn, Uranus and Neptune, each associated with specific ACM tool types, such as cleaning, polishing and packaging tools. The sun is labeled as “customer.”

Delving Deeper into the ACM Semiconductor Planetary Family Product Portfolio

May 18, 2026 ~ Following the launch of our ACM Planetary Family™, which brings together a process-aligned portfolio for semiconductor manufacturing, we delve deeper here into each of the planet series and how they reflect our product lines. Our offerings are grouped into eight different series that represent the essential stages in front-end and advanced packaging, providing a clearer path to identifying the right solutions for specific needs. With this approach, customers can more easily find the […] Read More

semiconductor wafer being processed

Selecting the Best Equipment and Process for Your Wet Cleaning Application

May 6, 2026 ~ As the feature sizes and critical dimensions of logic, memory and analog semiconductor devices shrink with advanced technology nodes, the sensitivity to submicron contaminants has increased significantly. Consequently, the use of wet cleaning technology to remove particulates and contaminants is critical to the success of semiconductor manufacturers. Single-wafer and batch cleaning technologies are both used […] Read More

Trends in Semiconductor Manufacturing: Wafer-Level and Panel-Level Packaging

April 3, 2026 ~ One of the most important shifts in semiconductor manufacturing today is not just the continued growth of wafer-level packaging (WLP), but the increasing reliance on enabling, highly specialized process technologies. As device architectures evolve toward heterogeneous integration (HI) and chiplet-based designs, key technologies such as wet processing, electrochemical plating (ECP), plasma-enhanced chemical vapor deposition (PECVD), […] Read More

Wide-Bandgap Semiconductor Cleaning Technology Enables Critical Power Applications

February 17, 2026 ~ Silicon carbide (SiC) and gallium nitride (GaN) are becoming mainstream within the semiconductor industry due to material properties that make them ideal for multiple applications. These properties—ranging from high thermal conductivity and mechanical strength to optical refractive index control—have made SiC and GaN suitable candidates for multiple end products.  Some key applications include power and […] Read More

2025 Reflection: Advanced Packaging Innovations and Accolades

December 15, 2025 ~ As 2025 comes to a close, ACM Research reflects on a year of advanced packaging innovations, global collaboration, and industry recognition. From wafer-level packaging (WLP) to panel-level packaging (PLP), our team has expanded the capabilities of semiconductor manufacturing tools while connecting with customers and partners across the globe to deliver solutions that drive real-world impact.  […] Read More

ACM CEO Dr. David Wange accepting the Global SMT award

ACM Research’s Ultra C vac-p Flux Cleaning Tool Wins Global Technology Award in Cleaning Equipment

November 24, 2025 ~ ACM Research was honored to receive a 2025 Global Technology Award in the category of Cleaning Equipment for its Ultra C vac-p flux cleaning tool. Presented annually by Global SMT & Packaging, the awards recognize top-performing and trailblazing solutions addressing the electronics manufacturing industry’s most critical challenges. The award was presented during a ceremony at […] Read More